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プラズマによる極薄膜シリコン酸化物成長とその物理的性質
(Growth of ultrathin silicon oxide films using an oxygen plasma and their physical properties)
International Workshop on Formation and Reliability of Ultrathin. 1998-01-23.
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Created at: 2017-02-18 01:24:04 +0900 Updated at: 2017-07-10 17:46:24 +0900