HOME > Presentation > Detail
SPring-8における透明アモルファス酸化物薄膜ん９硬Ｘ線光電子分往訪による評価
(Evaluation of TAOS by Hard X-ray Photoemission Spectroscopy at SPring-8.)
Intn. Symp. on Transparent Amorphous Oxide Semiconductors. 2006-11-22. Invited
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 04:45:18 +0900 Updated at: 2024-03-05 11:41:18 +0900