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量子化学計算による水素終端Si表面の初期酸化における酸素配置の検討
(Quantum chemical study on the oxygen configulation at the initial oxidation of hydrogen terminated Si surface)
Int.Workshop on FCRUSD. 1998-01-23.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-18 01:24:07 +0900 Updated at: 2017-07-10 17:46:26 +0900