Anisotropic oxygen reactive ion etching for residual layer removal of UV nanoimprinted 45-nm-wide line patterns
8th International Microprocesses and Nanotechnology Conference. 2015.
NIMS著者
Materials Data Repository (MDR)上の本文・データセット
作成時刻: 2017-02-14 11:15:10 +0900更新時刻: 2017-07-10 22:19:32 +0900