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イオン注入法により作製した超伝導性Mo-N化合物薄膜の電子構造.
(Electronic Structure of Superconducting MoN Thin Films Produced by Ion Implantation.)
IBMM'88. June 12, 1988-June 17, 1988.
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Created at: 2017-02-18 00:13:38 +0900 Updated at: 2017-07-10 17:07:10 +0900