HOME > Presentation > Detailアモルファス構造の電子線動径分布解析への非弾性散乱、多重散乱の影響(Influence of inelastic scattering intensity and multiple scattering intensity in electron diffraction analysis of amorphous allo)大久保 忠勝, 弘津禎彦. 電子顕微鏡学会第58回学術講演会. May 14, 2002-May 16, 2002.NIMS author(s)OHKUBO, TadakatsuFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2017-02-18 02:38:17 +0900 Updated at: 2017-07-10 18:25:38 +0900