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プラズマソースイオン注入による炭素膜形成過程に及ぼすAr及びC2H2ガス圧の影響
(Effect of Ar and C2H2 gas pressure on formation process of carbon films by plasma source ion implantation)
日本金属学会１９９９年秋期大会. November 20, 1999-November 22, 1999.
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Created at: 2017-02-18 01:50:32 +0900 Updated at: 2017-07-10 18:00:27 +0900