HOME > Presentation > Detail
ホログラフィック干渉計を用いた磁場中銅電析におけるCu2+濃度分布
(In-situ observation of Cu2+ concentration distribution near electrode interface by holographic interferometric microscopy during Cu electrodeposition in magnetic field)
2017年電気化学会秋季大会. 2017.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-08-26 22:32:34 +0900Updated at: 2018-06-05 14:11:55 +0900