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NH3を用いたLL-D&A法により作製したHfAlOx(N)膜中の窒素の結合状態と電気特性
(Influence of nitrogen bonds on electrical properties of HfAlOx(N) films fabricated through LL-D&A process using NH3)
第9回「極薄シリコン酸化膜の形成・評価・信頼性」. January 23, 2004-January 24, 2004.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-01-08 03:48:01 +0900 Updated at: 2017-07-10 18:53:46 +0900