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Cu/Ta2O5/Pt素子におけるCuフィラメント形成過程の活性化障壁測定
(The Activation Energy of a Cu/Ta2O5/Pt Device on Switch-ON Process)
第64回応用物理学会春季学術講演会. March 14, 2017-March 17, 2017.
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-19 04:40:41 +0900Updated at: 2017-07-10 22:36:04 +0900