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High-k/MetalゲートMoS2MOSFETの試作と評価
(Fabrication and Characterization of MoS2 MOSFET with High-k/Metal Gate)
電子情報通信学会 シリコン材料・デバイス研究会. 2015-06-19. Invited
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-02-14 11:37:14 +0900Updated at: 2024-03-05 11:45:47 +0900