高純度立方晶窒化ホウ素薄膜の製造方法 | SAMURAI, NIMS Researchers Directory Service

Scheduled downtime (October 31st and November 1st, 2026) (2026-10-29)

HOME > Published patent applications > Detail

[Published patent application] 高純度立方晶窒化ホウ素薄膜の製造方法

1999-01-19. H11012717 (Google Patents) , 3318600

NIMS author(s)

Created at :2023-07-22 21:44:35 +0900 Updated at :2023-07-22 21:44:35 +0900

▲ Go to the top of this page