HOME > Misc > DetailIn-situ TEM observation of silicide formation and dopant segregation in Ni fully silicided gatesTakuji Hosoi, Kentaro Shibahara, HASEGAWA, Akira, FURUYA, Kazuo. Extended Abstracts and Program of ISCSI-V 147-148. 2007.NIMS author(s)Fulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2022-09-05 12:02:41 +0900 Updated at: 2022-09-05 12:02:41 +0900
