HOME > その他の文献 > 書誌詳細Diameter-controlled Defect-free Si Nanostructure Using Neutral Beam Etching for Realistic Quantum Effect DevicesTakeshi Hashimoto, Chi-Hsien Huang, Tomohiro Kubota, TAKEGUCHI, Masaki, Kensuke Nishioka, Yukiharu Uraoka, Takashi Fuyuki, Ichiro Yamashita, Seiji Samukawa. Proceedings of 29th International Symposium on Dry Process 19-20. 2007.NIMS著者竹口 雅樹Materials Data Repository (MDR)上の本文・データセット作成時刻: 2022-09-05 12:02:45 +0900更新時刻: 2022-09-05 12:02:45 +0900
