HOME > 書籍 > 書誌詳細Reflection high-energy electron diffration intensity oscillation-AN effective tool of Si and GexSi1-x molecular beam epitaxy坂本統徳, 坂本邦博, 永尾悟, 橋口元, 国吉勝吉, 板東義雄. Thin film growth techniques for low-dimensional structures 225. 1987.NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2022-09-05 10:29:38 +0900 更新時刻: 2023-04-09 14:51:25 +0900
