HOME > 論文 > 書誌詳細Thin-film transistors fabricated by low-temperature process based on Ga- and Zn-free amorphous oxide semiconductorShinya Aikawa, Peter Darmawan, Keiichi Yanagisawa, Toshihide Nabatame, Yoshiyuki Abe, Kazuhito Tsukagoshi. Applied Physics Letters 102 [10] 102101. 2013.https://doi.org/10.1063/1.4794903 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 17:25:04 +0900更新時刻: 2024-03-31 13:44:36 +0900
