Ryoma Hayakawa; Ayse Turak; XueNa Zhang; Nobuya Hiroshiba; Helmut Dosch; Toyohiro Chikyow; Yutaka Wakayama

doi:10.1063/1.3456733

Strain-effect for controlled growth mode and well-ordered structure of quaterrylene thin films

著者	Ryoma Hayakawa, Ayse Turak, XueNa Zhang, Nobuya Hiroshiba, Helmut Dosch, Toyohiro Chikyow, Yutaka Wakayama.
掲載誌名	The Journal of Chemical Physics 133 [3] 034706 ISSN: 00219606, 10897690 ESIでのカテゴリ: CHEMISTRY
出版社	AIP Publishing
発表年	2010
言語	English
DOI	https://doi.org/10.1063/1.3456733
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