HOME > 論文 > 書誌詳細Ab Initio Simulation of Position-Dependent Electron Energy Loss and Its Application to the Plasmon Excitation of NanographeneDabao Lu, Zhufeng Hou, Xun Liu, Bo Da, Z. J. Ding. The Journal of Physical Chemistry C 123 [41] 25341-25348. 2019.https://doi.org/10.1021/acs.jpcc.9b06602 NIMS著者ホー ズーフォン達 博Materials Data Repository (MDR)上の本文・データセット作成時刻: 2020-06-02 00:46:41 +0900 更新時刻: 2025-04-18 04:20:42 +0900
