Ab Initio Simulation of Position-Dependent Electron Energy Loss and Its Application to the Plasmon Excitation of Nanographene
著者 | Dabao Lu, Zhufeng Hou, Xun Liu, Bo Da, Z. J. Ding. |
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掲載誌名 | The Journal of Physical Chemistry C 123 [41] 25341-25348 ISSN: 19327455, 19327447 ESIでのカテゴリ: CHEMISTRY |
出版社 | American Chemical Society (ACS) |
発表年 | 2019 |
言語 | English |
DOI | https://doi.org/10.1021/acs.jpcc.9b06602 |
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