Ab Initio Simulation of Position-Dependent Electron Energy Loss and Its Application to the Plasmon Excitation of Nanographene
| 著者 | Dabao Lu, Zhufeng Hou, Xun Liu, Bo Da, Z. J. Ding. |
|---|---|
| 掲載誌名 | The Journal of Physical Chemistry C 123 [41] 25341-25348 ISSN: 19327455, 19327447 ESIでのカテゴリ: CHEMISTRY |
| 出版社 | American Chemical Society (ACS) |
| 発表年 | 2019 |
| 言語 | English |
| DOI | https://doi.org/10.1021/acs.jpcc.9b06602 |
| この文献をMendeleyにインポート |  |