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Ab Initio Simulation of Position-Dependent Electron Energy Loss and Its Application to the Plasmon Excitation of Nanographene

著者Dabao Lu, Zhufeng Hou, Xun Liu, Bo Da, Z. J. Ding.
掲載誌名The Journal of Physical Chemistry C 123 [41] 25341-25348
ISSN: 19327455, 19327447
ESIでのカテゴリ: CHEMISTRY
出版社American Chemical Society (ACS)
発表年2019
言語English
DOIhttps://doi.org/10.1021/acs.jpcc.9b06602
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