HOME > Article > DetailSilicon Micro/Nanofabrication Using Metastable Helium Atom Beam LithographyZ. P. Wang, M. Kurahashi, T. Suzuki, Z. J. Ding, Y. Yamauchi. Journal of Nanoscience and Nanotechnology 10 [11] 7443-7446. 2010.https://doi.org/10.1166/jnn.2010.2853 NIMS author(s)Fulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 16:02:44 +0900Updated at: 2024-04-02 05:57:18 +0900
