Atomic Layer-Deposited Interlayers for Robust Metal–Polymer Interfaces

Johanna Byloff; Claus Othmar Wolfgang Trost; Vivek Devulapalli; Shuhel Altaf Husain; Damien Faurie; Pierre-Olivier Renault; Thomas Edward James Edwards; Megan J. Cordill; Daniele Casari; Barbara Putz; Johanna Byloff; Claus Othmar Wolfgang Trost; Vivek Devulapalli; Shuhel Altaf Husain; Damien Faurie; Pierre-Olivier Renault; Thomas Edward James Edwards; Megan J. Cordill; Daniele Casari; Barbara Putz

doi:10.1021/acsami.5c05156

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Atomic Layer-Deposited Interlayers for Robust Metal–Polymer Interfaces

Johanna Byloff, Claus Othmar Wolfgang Trost, Vivek Devulapalli, Shuhel Altaf Husain, Damien Faurie, Pierre-Olivier Renault, Thomas Edward James Edwards, Megan J. Cordill, Daniele Casari, Barbara Putz.

ACS Applied Materials & Interfaces 17 [28] 41224-41236. 2025.

https://doi.org/10.1021/acsami.5c05156

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MDRavailable Atomic Layer-Deposited Interlayers for Robust Metal–Polymer Interfaces

作成時刻: 2025-08-20 03:12:21 +0900 更新時刻: 2026-10-03 07:07:40 +0900