Interface control and modification of band alignment and electrical properties of HfTiO/GaAs gate stacks by nitrogen incorporation

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Gang He, Jiangwei Liu, Hanshuang Chen, Yanmei Liu, Zhaoqi Sun, Xiaoshuang Chen, Mao Liu, Lide Zhang.

J. Mater. Chem. C 2 [27] 5299-5308. 2014.

作成時刻: 2016-05-24 17:32:25 +0900更新時刻: 2024-04-02 04:08:20 +0900