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Redox Reactions at Cu,Ag/Ta2O5Interfaces and the Effects of Ta2O5Film Density on the Forming Process in Atomic Switch Structures
(Redox reactions at Cu,Ag/Ta2O5 interfaces and the effects of Ta2O5 film density on the forming process in atomic switch structures)

Tohru Tsuruoka, Ilia Valov, Stefan Tappertzhofen, Jan van den Hurk, Tsuyoshi Hasegawa, Rainer Waser, Masakazu Aono.
Advanced Functional Materials 25 [40] 6374-6381. 2015.


    Materials Data Repository (MDR)上の本文・データセット

      作成時刻: 2016-05-24 17:36:26 +0900更新時刻: 2024-03-31 15:19:34 +0900