Redox reactions at Cu,Ag/Ta2O5 interfaces and the effects of Ta2O5 film density on the forming process in atomic switch structures

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Redox Reactions at Cu,Ag/Ta₂O₅Interfaces and the Effects of Ta₂O₅Film Density on the Forming Process in Atomic Switch Structures
(Redox reactions at Cu,Ag/Ta2O5 interfaces and the effects of Ta2O5 film density on the forming process in atomic switch structures)

Tohru Tsuruoka, Ilia Valov, Stefan Tappertzhofen, Jan van den Hurk, Tsuyoshi Hasegawa, Rainer Waser, Masakazu Aono.

作成時刻: 2016-05-24 17:36:26 +0900 更新時刻: 2026-09-29 07:38:35 +0900