In situ high-temperature X-ray observation of crystallization during the fabrication of non-silica(20ZnO 80TeO2) glass-preform of optical devices. | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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In situ high-temperature X-ray observation of crystallization during the fabrication of non-silica(20ZnO 80TeO2) glass-preform of optical devices.
(光学デバイス用非シリケートプリフォーム作製の過程で生じる結晶化の高温X線その場観察)

Akihiko NUKUI, Shin-ichi TODOROKI, Masaaki MIYATA, Yoshio BANDO.

Journal of Advanced Science 13 [3] 367-370. 2001.

https://doi.org/10.2978/jsas.13.367

Open Access Society of Advanced Science (Publisher)

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2016-05-24 11:55:16 +0900 更新時刻: 2025-12-28 05:49:30 +0900

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