Nanoepitaxy of Anatase-type TiO2 on CeO2 Nanocubes Self-Assembled on a Si Substrate for Fabricating Well-Aligned Nanoscale Heterogeneous Interfaces

Daisuke Hojo; Takanari Togashi; Takeo Ohsawa; Mitsuhiro Saito; Zhongchang Wang; Yusuke Sakuda; Shunsuke Asahina; Yuichi Ikuhara; Taro Hitosugi; Tadafumi Adschiri

doi:10.1021/cg500821z

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Nanoepitaxy of Anatase-type TiO2 on CeO2 Nanocubes Self-Assembled on a Si Substrate for Fabricating Well-Aligned Nanoscale Heterogeneous Interfaces
(Nanoepitaxy of Anatase-type TiO2 on CeO2 Nanocubes Self-Assembled on a Si Substrate for Fabricating Well-Aligned Nanoscale Heterogeneous Interfaces)

Daisuke Hojo, Takanari Togashi, Takeo Ohsawa, Mitsuhiro Saito, Zhongchang Wang, Yusuke Sakuda, Shunsuke Asahina, Yuichi Ikuhara, Taro Hitosugi, Tadafumi Adschiri.

Crystal Growth & Design 14 [9] 4714-4720. 2014.

https://doi.org/10.1021/cg500821z

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Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2016-05-24 17:33:01 +0900更新時刻: 2024-04-02 04:51:25 +0900

Nanoepitaxy of Anatase-type TiO2 on CeO2 Nanocubes Self-Assembled on a Si Substrate for Fabricating Well-Aligned Nanoscale Heterogeneous Interfaces(Nanoepitaxy of Anatase-type TiO2 on CeO2 Nanocubes Self-Assembled on a Si Substrate for Fabricating Well-Aligned Nanoscale Heterogeneous Interfaces)

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

Nanoepitaxy of Anatase-type TiO2 on CeO2 Nanocubes Self-Assembled on a Si Substrate for Fabricating Well-Aligned Nanoscale Heterogeneous Interfaces
(Nanoepitaxy of Anatase-type TiO2 on CeO2 Nanocubes Self-Assembled on a Si Substrate for Fabricating Well-Aligned Nanoscale Heterogeneous Interfaces)