HOME > 論文 > 書誌詳細Selection of Di(meth)acrylate Monomers for Low Pollution of Fluorinated Mold Surfaces in Ultraviolet Nanoimprint LithographyMasaru Nakagawa, Kei Kobayashi, Azusa N. Hattori, Shunya Ito, Nobuya Hiroshiba, Shoichi Kubo, Hidekazu Tanaka. Langmuir 31 [14] 4188-4195. 2015.https://doi.org/10.1021/acs.langmuir.5b00325 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 18:02:53 +0900更新時刻: 2024-04-01 18:36:20 +0900
