Electronic structural analysis of transparent In2O3-ZnO films by hard X-ray photoelectron spectroscopy

Tadao Shibuya; Masahiro Yoshinaka; Yukio Shimane; Futoshi Utsuno; Koki Yano; Kazuyoshi Inoue; Eiji Ikenagab; Jung J. Kim; Shigenori Ueda; Masaaki Obata; Keisuke Kobayashi; Tadao Shibuya; Masahiro Yoshinaka; Yukio Shimane; Futoshi Utsuno; Koki Yano; Kazuyoshi Inoue; Eiji Ikenagab; Jung J. Kim; Shigenori Ueda; Masaaki Obata; Keisuke Kobayashi

doi:10.1016/j.tsf.2009.09.170

Electronic structural analysis of transparent In2O3-ZnO films by hard X-ray photoelectron spectroscopy

Tadao Shibuya, Masahiro Yoshinaka, Yukio Shimane, Futoshi Utsuno, Koki Yano, Kazuyoshi Inoue, Eiji Ikenagab, Jung J. Kim, Shigenori Ueda, Masaaki Obata, Keisuke Kobayashi.

Thin Solid Films 518 [11] 3008-3011. 2010.

https://doi.org/10.1016/j.tsf.2009.09.170

NIMS author(s)

UEDA, Shigenori

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2018-06-08 21:30:06 +0900 Updated at: 2026-11-04 05:01:01 +0900