Local retarding field for ions towards a positively biased substrate in plasma and its application to soft ion-bombarding processing
(正バイアスされた基板へのイオンの障壁電場とそのイオン衝撃緩和プロセスへの応用)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2016-05-24 15:12:19 +0900 Updated at: 2026-11-01 05:07:49 +0900