Reduction and removing of Al oxide film deposited on Cu substrate by electron beam
(Cu基板上に蒸着したAl2O3膜の電子線による還元)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2022-11-15 00:39:27 +0900 Updated at: 2022-11-15 00:39:27 +0900