SAMURAI - NIMS Researchers Database

HOME > Article > Detail

CVD and ALD Co(W) Films Using Amidinato Precursors as a Single-Layered Barrier/Liner for Next-Generation Cu-Interconnects
(将来的Cu配線のための単層バリア/ライナーとしてのCVDおよびALD Co(W)膜)

Hideharu Shimizu, Yudai Suzuki, Takeshi Nogami, Nobuo Tajima, Takeshi Momose, Yoshihiko Kobayashi, Yukihiro Shimogaki.
ECS Journal of Solid State Science and Technology 2 [7] P311-P315. 2013.
https://doi.org/10.1149/2.008307jss

NIMS author(s)

    Fulltext and dataset(s) on Materials Data Repository (MDR)

      Created at: 2016-05-24 17:28:23 +0900Updated at: 2025-01-16 05:39:46 +0900

      ▲ Go to the top of this page