Phase-selective sputter epitaxy of <i>δ</i> -NbN, <i>γ</i> -Nb4N3, and <i>β</i> -Nb2N on atomically flat AlN | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Phase-selective sputter epitaxy of δ -NbN, γ -Nb4N3, and β -Nb2N on atomically flat AlN

Yuki Kato, Koryo Masuzawa, Takayuki Harada, Hideto Miyake, Atsushi Kobayashi, Yuki Kato, Koryo Masuzawa, Hideto Miyake, Atsushi Kobayashi.

Journal of Applied Physics 139 [18] 185301. 2026.

https://doi.org/10.1063/5.0311297

Open Access AIP Publishing (Publisher) Materials Data Repository (MDR)

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MDRavailable Phase-selective sputter epitaxy of <i>δ</i> -NbN, <i>γ</i> -Nb4N3, and <i>β</i> -Nb2N on atomically flat AlN

作成時刻: 2026-06-11 03:08:05 +0900 更新時刻: 2026-07-12 04:36:15 +0900

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