HOME > 論文 > 書誌詳細Pattern evolution of crystalline Ge aggregates during annealing of an Al/Ge bilayer film deposited on a SiO2 substrateMinoru Doi, Yasuhito Suzuki, Toshiyuki Koyama, Futoshi Katsuki. Philosophical Magazine Letters 78 [3] 241-245. 1998.https://doi.org/10.1080/095008398177995 NIMS著者小山 敏幸Materials Data Repository (MDR)上の本文・データセット作成時刻: 2025-04-25 09:19:20 +0900 更新時刻: 2026-10-13 04:40:33 +0900
