Nanolaminated Al100−Ni / AlO H thin films by hybrid PVD / ALD: An approach towards interface-engineered thin films by dual-route tailoring | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Nanolaminated Al100−Ni / AlO H thin films by hybrid PVD / ALD: An approach towards interface-engineered thin films by dual-route tailoring

Hendrik C. Jansen, Amit Sharma, Marcus Hans, Jochen M Schneider, Jakob Schwiedrzik, Johann Michler, Thomas E.J. Edwards.

Materials & Design 263 115580. 2026.

https://doi.org/10.1016/j.matdes.2026.115580

Open Access Elsevier BV (Publisher) Materials Data Repository (MDR)

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MDRavailable Nanolaminated Al100−Ni / AlO H thin films by hybrid PVD / ALD: An approach towards interface-engineered thin films by dual-route tailoring

作成時刻: 2026-04-11 03:08:04 +0900 更新時刻: 2026-10-17 04:31:58 +0900

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