HOME > 論文 > 書誌詳細Electronic decoupling by h-BN layer between silicene and Cu(111): A DFT-based analysisMao Kanno, Ryuichi Arafune, Chun Liang Lin, Emi Minamitani, Maki Kawai, Noriaki Takagi. New Journal of Physics 16 [10] 105019. 2014.https://doi.org/10.1088/1367-2630/16/10/105019 Open Access IOP Publishing (Publisher) NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 17:43:20 +0900更新時刻: 2024-03-31 13:50:07 +0900
