HOME > Article > DetailElectronic decoupling by h-BN layer between silicene and Cu(111): A DFT-based analysisMao Kanno, Ryuichi Arafune, Chun Liang Lin, Emi Minamitani, Maki Kawai, Noriaki Takagi. New Journal of Physics 16 [10] 105019. 2014.https://doi.org/10.1088/1367-2630/16/10/105019 Open Access IOP Publishing (Publisher) NIMS author(s)Fulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 17:43:20 +0900 Updated at: 2026-09-29 07:02:55 +0900
