An Ellipsometry Study of the Effects of DC Bias of the Plasma Oxidation of Silicon | SAMURAI, NIMS Researchers Directory Service

HOME > Article > Detail

An Ellipsometry Study of the Effects of DC Bias of the Plasma Oxidation of Silicon
(直流バイアス印力0によるシリコンの表面酸化のエリプソメトリー研究)

M. Kitajima, 上岡功, 中村一隆, 河辺隆也, I. Kamioka, K.G. Nakamura, T. Kawabe.

Solid State Communications 97 [6] 531-534. 1996.

https://doi.org/10.1016/0038-1098(95)00618-4

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2016-05-24 11:36:36 +0900 Updated at: 2026-09-30 04:16:28 +0900

▲ Go to the top of this page