Commento on "High intensity low tube-voltage X-ray source for laboratory Extended X-ray Absorption Fine Structure measurements"
(「ラボラトリEXAFSのための高強度ー低電圧x線源」(Rev.Sci.Instrum.64,2702(1993)) へのコメント)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2017-03-13 20:33:38 +0900Updated at: 2024-04-01 23:21:53 +0900