Microstructure and shape memory behavior of annealed Ti44.5Ni55.5−Cu (X= 15.3–32.8) thin films with low Ti content
(低Ti濃度のTi44.5Ni55.5-xCux(x=15.3-32.8)合金薄膜の微細組織と形状記憶特性)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2016-05-24 17:33:42 +0900 Updated at: 2026-11-09 05:46:49 +0900