<i>Ab initio</i>study of incorporation of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mi mathvariant="normal">O</mml:mi><mml:mn>2</mml:mn></mml:msub></mml:mrow></mml:math>molecules into<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:mi mathvariant="normal">Si</mml:mi><mml:mo>(</mml:mo><mml:mn>001</mml:mn><mml:mo>)</mml:mo></mml:mrow></mml:math>surfaces: Oxidation by<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:mi mathvariant="normal">Si</mml:mi></mml:mrow></mml:math>ejection

Ab initiostudy of incorporation ofO2molecules intoSi(001)surfaces: Oxidation bySiejection
(Ab initiostudy of incorporation ofO2molecules intoSi(001)surfaces: Oxidation bySiejection)

B. D. Yu, Young Jin Kim, Junjin Jeon, Hanchul Kim, H. W. Yeom, I. W. Lyo, Ki-jeong Kong, Y. Miyamoto, O. Sugino, T. Ohno.

Physical Review B 70 [3] 033307. 2004.

Created at: 2016-05-24 14:40:17 +0900Updated at: 2024-04-02 06:15:24 +0900