Skeletal Si-O-Si Network Connectivity of Self-assembled Porous Silica for Low-k Dielectrics Depending on Organoalkoxysilane Concentration in Precursor solutions | 研究者総覧SAMURAI - 物質・材料研究機構 (NIMS)

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Skeletal Si-O-Si Network Connectivity of Self-assembled Porous Silica for Low-k Dielectrics Depending on Organoalkoxysilane Concentration in Precursor solutions

Syozo Takada, Nobuhiro Hata, Kikuko Hayamizu, Miwa Murakami, Kenzo Deguchi, Shinobu Ohki, Masataka Tansho, Tadashi Shimizu.

Journal of Applied Physics 101 [6] 064301. 2007.

https://doi.org/10.1063/1.2512648

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作成時刻: 2016-05-24 15:15:15 +0900更新時刻: 2024-04-01 18:26:31 +0900

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