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Microbubble Formation from Ionic Vacancies in Copper Electrodeposition under a High Magnetic Field
(強磁場下での銅の電着におけるイオン空孔からマイクロバブルの形成)

Makoto MIURA, Ryoichi AOGAKI, Yoshinobu OSHIKIRI, Atsushi SUGIYAMA, Ryoichi MORIMOTO, Miki MIURA, Iwao MOGI, Yusuke YAMAUCHI.
Electrochemistry 82 [8] 654-657. 2014.

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      Created at: 2016-05-24 17:44:07 +0900 Updated at: 2026-11-09 07:57:21 +0900

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