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HAXPES study of CeO thin film–silicon oxide interface
(HAXPES study of CeOx thin film–silicon oxide interface)

M. Vorokhta, I. Matolínová, M. Dubau, S. Haviar, I. Khalakhan, K. Ševčíková, T. Mori, H. Yoshikawa, V. Matolín.
Applied Surface Science 303 46-53. 2014.
https://doi.org/10.1016/j.apsusc.2014.02.048

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