Large-Scale 1T′-Phase Tungsten Disulfide Atomic Layers Grown by Gas-Source Chemical Vapor Deposition

Mitsuhiro Okada; Jiang Pu; Yung-Chang Lin; Takahiko Endo; Naoya Okada; Wen-Hsin Chang; Anh Khoa Augustin Lu; Takeshi Nakanishi; Tetsuo Shimizu; Toshitaka Kubo; Yasumitsu Miyata; Kazu Suenaga; Taishi Takenobu; Takatoshi Yamada; Toshifumi Irisawa; Mitsuhiro Okada; Jiang Pu; Yung-Chang Lin; Takahiko Endo; Naoya Okada; Wen-Hsin Chang; Anh Khoa Augustin Lu; Takeshi Nakanishi; Tetsuo Shimizu; Toshitaka Kubo; Yasumitsu Miyata; Kazu Suenaga; Taishi Takenobu; Takatoshi Yamada; Toshifumi Irisawa

doi:10.1021/acsnano.2c05699

Large-Scale 1T′-Phase Tungsten Disulfide Atomic Layers Grown by Gas-Source Chemical Vapor Deposition

Mitsuhiro Okada, Jiang Pu, Yung-Chang Lin, Takahiko Endo, Naoya Okada, Wen-Hsin Chang, Anh Khoa Augustin Lu, Takeshi Nakanishi, Tetsuo Shimizu, Toshitaka Kubo, Yasumitsu Miyata, Kazu Suenaga, Taishi Takenobu, Takatoshi Yamada, Toshifumi Irisawa.

ACS Nano 16 [8] 13069-13081. 2022.

https://doi.org/10.1021/acsnano.2c05699

NIMS author(s)

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2022-11-23 03:25:08 +0900Updated at: 2024-04-02 05:27:45 +0900