Surface Stress in thin silicon Oxide Layer made by Plasma Oxidation with Applying Sample Bias
(試料バイアスをかけてプラズマ酸化したシリコン酸化した膜中に生じる表面応力)
NIMS author(s)
Fulltext and dataset(s) on Materials Data Repository (MDR)
Created at: 2022-11-15 00:39:27 +0900 Updated at: 2022-11-15 00:39:27 +0900