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Effect of gas adsorption on the segregation behavior of substrate Cu on Ti film
(基板元素の薄膜上への偏析挙動に与えるガス吸着の影響)

M. Yoshitake, K. Yoshihara.
Applied Surface Science 100-101 203-206. 1996.

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    Created at: 2016-05-24 11:35:49 +0900 Updated at: 2026-09-30 04:48:42 +0900

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