HOME > Article > DetailEffect of gas adsorption on the segregation behavior of substrate Cu on Ti film(基板元素の薄膜上への偏析挙動に与えるガス吸着の影響)M. Yoshitake, K. Yoshihara. Applied Surface Science 100-101 203-206. 1996.https://doi.org/10.1016/0169-4332(96)00287-5 NIMS author(s)YOSHITAKE, MichikoFulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 11:35:49 +0900 Updated at: 2026-09-30 04:48:42 +0900