HOME > 論文 > 書誌詳細Crystallization of amorphous germanium in an Al/a-Ge bilayer film deposited on a SiO2 substrateFutoshi Katsuki, Kenji Hanafusa, Mitsuharu Yonemura, Toshiyuki Koyama, Minoru Doi. Journal of Applied Physics 89 [8] 4643-4647. 2001.https://doi.org/10.1063/1.1359149 NIMS著者小山 敏幸Materials Data Repository (MDR)上の本文・データセット作成時刻: 2025-04-25 09:19:13 +0900 更新時刻: 2026-09-12 04:40:12 +0900
