HOME > 論文 > 書誌詳細Helium ion implantation-induced defects in silicon probed with variable-energy positronsM. Fujinami, T. Miyagoe, T. Sawada, R. Suzuki, T. Ohdaira, T. Akahane. Physical Review B 68 [16] 165332. 2003.https://doi.org/10.1103/physrevb.68.165332 NIMS著者Materials Data Repository (MDR)上の本文・データセット作成時刻: 2016-05-24 12:00:37 +0900更新時刻: 2024-04-02 06:13:04 +0900
