A New Silicon Quantum-Well Structure with Controlled Diameter and Thickness Fabricated with Ferritin Iron Core Mask and Chlorine Neutral Beam Etching

寒川誠二; 久保田智広; 黄啓賢; 橋本剛; 五十嵐誠; 西岡賢祐; 竹口 雅樹; 浦岡行治; 冬木隆; 山下一郎; SAMUKAWASeiji; KUBOTATomohiro; Chi-Hsien Huang; HASHIMOTOTuyoshi; IGARASHIMakoto; NISHIOKAKensuke; TAKEGUCHI, Masaki; URAOKAYukiharu; HUYUKITakashi; YAMASHITAIchiro

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A New Silicon Quantum-Well Structure with Controlled Diameter and Thickness Fabricated with Ferritin Iron Core Mask and Chlorine Neutral Beam Etching

SAMUKAWASeiji, KUBOTATomohiro, Chi-Hsien Huang, HASHIMOTOTuyoshi, IGARASHIMakoto, NISHIOKAKensuke, TAKEGUCHI, Masaki, URAOKAYukiharu, HUYUKITakashi, YAMASHITAIchiro.

APPLIED PHYSICS EXPRESS 1 [7] 074002-1-074002-3. 2008.

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竹口雅樹

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作成時刻: 2016-05-24 15:32:28 +0900更新時刻: 2018-12-15 01:44:07 +0900