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Growth of Silicon Oxide on Silicon in the Thin Films Region in an Oxygen Plasma.
(極薄膜領域における酸化シリコン膜のプラズマ中成長.)

M. Kitajima, 黒木博, 新野仁, 中村一隆, H. Kuroki, H. Shinno, K.G. Nakamura.
Solid State Communications 83 [5] 385-388. 1992.
https://doi.org/10.1016/0038-1098(92)90250-d

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