Electrochemical and in situ SERS study of the role of an inhibiting additive in selective electrodeposition of copper in sulfuric acid | SAMURAI, NIMS Researchers Directory Service

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Electrochemical and in situ SERS study of the role of an inhibiting additive in selective electrodeposition of copper in sulfuric acid

Toshio Haba, Katsuyoshi Ikeda, Kohei Uosaki.

Electrochemistry Communications 98 19-22. 2019.

https://doi.org/10.1016/j.elecom.2018.11.007

Open Access Elsevier BV (Publisher)

NIMS author(s)

UOSAKI, Kohei

Fulltext and dataset(s) on Materials Data Repository (MDR)

Created at: 2021-03-12 03:00:19 +0900 Updated at: 2026-10-30 06:41:21 +0900

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