Chemical potential shift of Fe3－xVxSi studied by hard x-ray photoemission

Y. T. Cui; A. Kimura; K. Miyamoto; M. Taniguchi; T. Xie; S. Qiao; K. Shimada; H. Namatame; E. Ikenaga; K. Kobayashi; Hsin Lin; S. Kaprzyk; A. Bansil; O. Nashima; T. Kanomata; Y. T. Cui; A. Kimura; K. Miyamoto; M. Taniguchi; T. Xie; S. Qiao; K. Shimada; H. Namatame; E. Ikenaga; K. Kobayashi; Hsin Lin; S. Kaprzyk; A. Bansil; O. Nashima; T. Kanomata

doi:10.1103/physrevb.78.205113

HOME > 論文 > 書誌詳細

Chemical potential shift ofFe3−xVxSistudied by hard x-ray photoemission
(Chemical potential shift of Fe3－xVxSi studied by hard x-ray photoemission)

Y. T. Cui, A. Kimura, K. Miyamoto, M. Taniguchi, T. Xie, S. Qiao, K. Shimada, H. Namatame, E. Ikenaga, K. Kobayashi, Hsin Lin, S. Kaprzyk, A. Bansil, O. Nashima, T. Kanomata.

Physical Review B 78 [20] 205113. 2008.

https://doi.org/10.1103/physrevb.78.205113

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

作成時刻: 2016-05-24 15:48:52 +0900 更新時刻: 2026-10-30 08:49:45 +0900

Chemical potential shift ofFe3−xVxSistudied by hard x-ray photoemission(Chemical potential shift of Fe3－xVxSi studied by hard x-ray photoemission)

NIMS著者

Materials Data Repository (MDR)上の本文・データセット

Chemical potential shift ofFe3−xVxSistudied by hard x-ray photoemission
(Chemical potential shift of Fe3－xVxSi studied by hard x-ray photoemission)