HOME > Article > DetailElectronic state of interstitial Cu in bulk Si: Density functional calculationsF. J. H. Ehlers, A. P. Horsfield, D. R. Bowler. Physical Review B 73 [16] 165207. 2006.https://doi.org/10.1103/physrevb.73.165207 NIMS author(s)Fulltext and dataset(s) on Materials Data Repository (MDR)Created at: 2016-05-24 15:15:25 +0900 Updated at: 2026-11-04 05:46:06 +0900
